• 中文核心期刊要目总览
  • 中国科技核心期刊
  • 中国科学引文数据库(CSCD)
  • 中国科技论文与引文数据库(CSTPCD)
  • 中国学术期刊文摘数据库(CSAD)
  • 中国学术期刊(网络版)(CNKI)
  • 中文科技期刊数据库
  • 万方数据知识服务平台
  • 中国超星期刊域出版平台
  • 国家科技学术期刊开放平台
  • 荷兰文摘与引文数据库(SCOPUS)
  • 日本科学技术振兴机构数据库(JST)

应用修正Stoney公式原位测量硅薄膜电极中的锂化应力

Modified Stoney formula for in-situ lithiation stress measurement in thin-film Si electrode

  • 摘要: 结合Stoney公式的多光臂应力测量方法能够有效检测出薄膜电极在充放电过程中的平均应力.然而,经典Stoney公式仅适用于低应力水平的情况.运用修正的Stoney公式考虑了硅电极材料力学性质的变化和基底曲率剧烈 变化情况下电极薄膜中应力的演化规律.基于应力和扩散相互耦合的三维非线性有限元模型,验证了修正Stoney公 式的准确性.进一步,讨论了曲率分叉出现的条件,确保使用修正的Stoney公式时避免出现曲率分叉行为.

     

    Abstract: The multi-beam optical stress sensor method combined with Stoney equation is an effective approach to measure in-situ average stress in thin film electrodes upon lithiation / delithiation. However, the classic Stoney formula is applicable only at low stress states. A modified Stoney formula for stress measurement in thin-film Si electrodes was applied to account for the combined effects of the Li concentration-dependent material properties and large substrate curvature change. The numerical results based on three-dimensional non-linear finite element model for the full coupling of large deformation and Li diffusion confirm the accuracy of the modified Stoney equation. Further, a critical condition for the curvature bifurcation was discussed, which should be avoid when using the modified Stoney equation.

     

/

返回文章
返回