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氧化锌及银掺杂的氧化锌薄膜的紫外发光研究

Ultraviolet emission property of undoped and Ag doped ZnO films

  • 摘要: 采用超声喷雾热解工艺,在Si(100)衬底上制备了ZnO薄膜,研究了衬底温度、喷雾速率、银掺杂对ZnO薄膜发光性质的影响.结果表明,选择合适的沉积温度和喷雾速率能制备出具有良好结晶质量、强紫外发射、高紫外/可见发光强度比的ZnO薄膜.未掺杂样品中,在沉积温度为500 ℃、喷雾速率为015 mL/min条件制备的ZnO薄膜的近带边紫外发光性能最好,其紫外/可见发光强度比能够达到470.低浓度的银掺杂可以进一步提高ZnO的紫外发光性能,掺杂3%浓度的Ag可以使ZnO的紫外/可见发光强度比达到700.但过高浓度的掺杂反而会降低紫外发光强度.

     

    Abstract: ZnO films were prepared on Si(100) substrates by ultrasonic spray pyrolysis technique. The effect of growth temperature, spray rate and Ag doping on the emission property of ZnO films was studied. Results show that appropriate growth temperature and spray rate could lead to the good quality, excellent photoluminescence property and high PL intensity ratio (R) of the UV emission to the deep-level emission. Among undoped ZnO films, the sample deposited at 500 ℃ with a spray rate of 015 mL/min has the strongest near-band edge (NBE) ultraviolet emission, with the largest R of 470. Ag doping (with the Ag:Zn atomic ratio=3%) could enhance the UV emission of ZnO films, with the R increasing to at least 700. But excessively high concentration of Ag dopant may degrade the UV luminescence property.

     

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